Iiduka, R.
November 1997
Fuel and Energy Abstracts, vol 38-6, p. 416
A feasibility study was carried out on polycrystalline silicon (poly-Si) films deposited by catalytic CVD (cat-CVD) method as a solar cell material. The poly-Si films are obtained at 300°C by catalytic cracking reactions of a gaseous mixture of SiH4 and H2 on a heated tungsten (W) wire. Present poly-Si films consist of both amorphous and polycrystalline phases. Deposition conditions can be used to control the mixing ratio of amorphous to polycrystalline phases. The paper concludes that a cat-CVD poly-Si film is a feasible candidate for solar cell material, due to its large optical absorption and relatively large mobility of carrier transport.
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