Gourmelona, E.
July 1997
Fuel and Energy Abstracts, vol 38-4, p. 243
As long as the substrates used are each coated with a 10-20 nm Ni layer, photosensitive textured WS2 and MoS2 films can be obtained by the techniques of reactive sputtering and solid state reaction. MS2 (M = W, Mo) layers were deposited onto these substrates and then annealed for half an hour at 1073 K in an argon atmosphere. Textured films crystallized in the 2H-MS2 structure were obtained, with their C crystallite axes perpendicular to the plane of the substrate. The films are nearly stoichiometric. The optical absorption spectra are similar to those of single crystals, and the high photosensitivity of the films is attributed to a grain size enhancement by the Ni-S phase.
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